DXP-450B Laser Coating Equipment
Composition
The system mainly consists of sputtering vacuum chamber, rotating target platform, antioxidative substrate heat plate, working air circuit, air-bleed system, installation machine, vacuum measurement, electric control system and so on.
Technical Index
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Model |
DXP-450B |
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Main Vacuum Chamber |
Sphere, size: Ø450mm |
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Configuration of Vacuum System |
Mechanical pump, molecular pump |
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Ultimate Pressure |
≤6.67*10-6Pa (after bake and degassing) |
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Time of Recovery Vacuum |
Reach 5*10-3Pa in 20 mins ( expose in air for short time and inflate dry chlorine and then begin air exhaust) |
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Rotating Target Platform |
Target size: Ø60mm or Ø25mm, could install 4 pieces targets for one time, could achieve revolution change target and each target could achieve rotating. Rotating speed: 5-60 rpm |
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Substrate Heat Plate |
Sample Size |
2 inches |
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Mode of Motion |
Substrate could continuously rotate. revolving speed: 5-60rpm |
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Heat |
MAX. heat temperature of substrate 800℃±1℃ |
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Air Circuit System |
Quality flow controller 1 channel |
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Laser beam scanning device |
Two-dimension scanning mechanical stage, carry out two freely scanning |
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Computer Control System |
It controls revolution target plate, rotation of target, rotation of sample, control temperature of sample, laser beam scanning and so on. |
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Floor Space |
Mainframe |
1500*900mm2 |
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Electric Control Cabinet |
700*700mm2(1 sets) |
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