ThermalEvaporationVacuumCoatingMachine

Thermal Evaporation Vacuum Coating Machine

Composition

 

The system mainly consists of organic/ metal source evaporation sediment chamber, vacuum exhaust system, vacuum measurement system, evaporation source, sample heating control temperature, electronic control system, distribution system and so on.

 

 

Technical Index

 

Model

DXD-450

Main Vacuum Chamber

Square vacuum chamber, size: 400*400*400mm

Configuration of Vacuum System

Mechanical pump, molecular pump, slide valve

Ultimate Pressure

≤6*10-5Pa

Time of Recovery Vacuum

Reach 9*10-4Pa in 40 mins ( expose in air for short time and inflate dry chlorine and then begin air exhaust)

Substrate Heat Plate

Sample Size

120*120mm, 1 piece

Mode of Motion

Substrate could be up and down, mutation range: 0-50mm
Substrate could continuously rotate. revolving speed: 5-30rpm

Heat

MAX. heat temperature of substrate 800℃±1℃
The distance between substrate and evaporation: 250mm-300mm

Organic Resistance Evaporation Source

Crucible

Crucible capacity: ≥2cc

Temperature

Room temperature—500℃, continuous and adjustable

Power

Current: 300A, Max. output power: 3Kw

Water Cooling Electrode

 4 pieces, could be made into 2 evaporation boats

Quartz Crystal Film Thickness Controller

Monitor thickness of film display range: 0-99μ9999Å

Air Circuit System

Quality flow controller 1 channel

Laser beam scanning device

Two-dimension scanning mechanical stage, carry out two freely scanning

Computer Control System

It controls revolution target plate, rotation of target, rotation of sample, control temperature of sample, laser beam scanning and so on.

Floor Space

Mainframe

2450*1250mm2 ( independent rack, (770*600mm2) The size matches up glove case (1830*750mm2)

Electric Control Cabinet

700*700mm2(1 set)

 

DXD-450 Single Chamber Thermal Evaporation Vacuum Coating Machine is applied for the preparation of metal elementary substance film, semiconductor film, oxidized thin films, organic thin film, and so on. It can be used in research of new material, new technology films of scientific institutions. It could also used in test work before batch production.
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