Electronic Beam Evaporation Coating System

Model

DXD-500

Structure

The vacuum chamber adopts U shape crate with door front and has pump system behind.

Vacuum Chamber

500*500*600mm3

Configuration of Vacuum System

Compound molecular pump, mechanical pump, slide valve

Ultimate Pressure

≤6.67*10-5Pa (after bake and degassing)

Time of Recovery Vacuum

Reach 6.67*10-4Pa in 45 mins ( expose in air for short time and inflate dry chlorine and then begin air exhaust)

Electronic Beam Evaporation Source

E Shape Electronic Gun

Positive pole voltage: 6kv, 8kv

Quantity ( set)

2

Crucible

Water cooling crucible, four holes design, and capacity of each: 11ml

Power

0-6KW adjustable

Resistance Evaporation Source (Optional)

Voltage

5, 10V

Power

 Current: 300A, Max. output power: 3Kw

Quantity

 1 set, could be changed

Water Cooling Electrode

 3 pieces, could be made into 2 evaporation boats

Type and Size of Work Rest

Size of substrate: could place 4 inches substrate
MAX. heat temperature of substrate 800℃±1℃
The substrate could continuously rotate. revolving speed: 5-60rpm
The distance between substrate and evaporation source is 300-350mm, which is adjustable.
Components of manual control sample baffle 1 set

Air Circuit System

Quality flow controller 1 channel

Quartz Crystal Film Thickness Controller

Monitor thickness of film display range: 0-99μ9999Å

Floor Space

Mainframe

900*800mm2

Electric Control Cabinet

800*800mm2(2 sets)