Square Four Chambers Magnetron Sputtering System
Composition
The system mainly consists of sample injection chamber, sputtering chamber, sample making chamber, substrate delivery institution, pumping and vacuum measurement system, gas circuit system, electronic control system and so on.
Technical Index
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Model |
DXJ-1000 |
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Main Sputtering Vacuum Chamber |
Square sputtering vacuum chamber, size: 1000*700*350mm |
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Sample Injection Chamber, |
Square sputtering vacuum chamber, size: 700*700*350mm |
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Configuration of Vacuum System |
Mechanical pump, molecular pump, slide valve |
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Ultimate Pressure |
Main Sputtering Chamber |
≤8*10-5Pa (after bake and degassing) |
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Sample Injection |
≤6.6*10-4Pa (after bake and degassing) |
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Time of Recovery Vacuum |
Main Sputtering Chamber |
Reach 6.6*10-4Pa in 40 mins ( expose in air for short time and inflate dry chlorine and then begin air exhaust) |
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Sample Injection |
Reach 5*10-3Pa in 20 mins ( expose in air for short time and inflate dry chlorine and then begin air exhaust) |
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Component of Permanent Magnetron Sputtering Targets |
Two magnetron targets, square target about size: 450*75mm. The distance between target and sample is about 80mm. |
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Substrate Heat Plate |
Substrate Structure |
Size:125*125mm or 156*156mm It could be placed 4 pieces for one time. |
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Heat Temperature |
Room temperature about 400℃±2℃, could be controlled and adjustable |
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Other Configuration |
Equipped with ion gun washing and automatic control |
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Air Circuit System |
Quality flow controller 3 channel |
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Floor Space |
Mainframe |
2655*930mm2 |
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Electric Control Cabinet |
700*700mm2(2 sets) |
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