Lasermbesystem

Laser MBE System

Composition

 

The system mainly consists of vacuum chamber (epitaxy chamber and sample injection chamber, sample delivery institution, sample stand, rotating target platform, vacuum exhaust, vacuum measurement, electric appliance control, distribution, computer control and so on.

 

 

Technical Index

 

Model

DXLMBE-450

Main Vacuum Chamber

Sphere, size: Ø450mm

Sample Injection Chamber,

Cylindrical and horizontal, size: Ø150*300mm

Configuration of Vacuum System

Main Vacuum Chamber

Mechanical pump, molecular pump, lonic pump, sublimation pump,  valve

Sample Injection Chamber

Mechanicalpump, molecular pump, valve

Ultimate Pressure

Main Vacuum Chamber

≤5*10-8Pa (after bake and degassing)

Sample Injection
 Chamber

≤5*10-3Pa (after bake and degassing)

Time of Recovery Vacuum

Main Vacuum Chamber

Reach 5*10-3Pa in 20 mins ( expose in air for short time and inflate dry chlorine and then begin air exhaust)

Sample Injection
 Chamber

Reach 5*10-3Pa in 20 mins ( expose in air for short time and inflate dry chlorine and then begin air exhaust)

Rotating Target Platform

Max. target size: Ø70mm, could install 4 pieces targets for one time, could achieve revolution change target and each target could achieve rotating. Rotating speed: 5-60 rpm

Substrate Heat Plate

Sample Size

Ø51

Mode of Motion

Substrate could continuously rotate. revolving speed: 5-60rpm

Heat

MAX. heat temperature of substrate 800℃±1℃

Air Circuit System

Quality flow controller 1 channel, all-metal angle valve 1 channel

* Optional parts

Reflection high-energy electron diffraction (RHEED)

High energy power supply: Max. energy 25KV, Max. beam100μA

RHEED intensity oscillation, growth rate  monitoring system

Mainly consists of webcam, hardware, and computer control software package.

Laser beam scanning device

Two-dimension scanning mechanical stage, carry out two freely scanning

oxygen plasma generator and power supply

                   

Computer Control System

It controls revolution target plate, rotation of target, rotation of sample, control temperature of sample, laser beam scanning and so on.

Quadrupole Mass Spectrometer

Mass number: 1-100

Floor Space

Mainframe

1300*850mm2

Electric Control Cabinet

700*700mm2(2 sets)

 

DXLMBE-450 Laser Molecular Beam Epitaxy(MBE) System is for developing optical crystal, ferroelectric, ferromagnet, superconductor and organic compounds film material. It is especially for developing complicated stratiform superlattice thin film material with high melting point, multielement and containing gas elements. It can be widely applied for thin-film material scientific research and small-batch preparation of universities and research institutions.
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